Orthorhombic TaAs: A New Topological Phase of the Archetypical Weyl Semimetal
學年 114
學期 1
出版（發表）日期 2025-08-25
作品名稱 Orthorhombic TaAs: A New Topological Phase of the Archetypical Weyl Semimetal
作品名稱（其他語言）
著者 Z. Ogorzałek; C.-C. Lee; J. Z. Domagala; W. Zajkowska-Pietrzak; S. Kret; R. Bozėk; W. Pacuski; I. Lutsyk; W. Rys;́ P. J. Kowalczyk; M. Tokarczyk; M. Polakowski; D. Wasik; J. Sadowski; B.-H. Huang; H. Lin; and M. Gryglas-Borysiewicz
單位
出版者
著錄名稱、卷期、頁數 ACS Applied Materials Interfaces 17(36) 51386–51394
摘要 We report on a new, topologically nontrivial phase of TaAs identified in thin TaAs layers grown by molecular beam epitaxy. Structural investigations clearly show a new atom arrangement, confirmed by the presence of 104 reflections in the X-ray diffraction pattern, forbidden for the well-known tetragonal phase. Density functional theory confirms the presence of a new orthorhombic phase and reveals that its formation energy is slightly higher (by ∼0.6 meV per atom) than for the tetragonal phase. The orthorhombic TaAs is a topological Weyl semimetal with 20 Weyl nodes. Weak antilocalization of a topological origin is observed at low temperatures. With the Fermi energy relatively deep in the valence band, no other signatures of the chiral properties are resolved. The demonstration of the new phase, combined with the molecular beam epitaxy capabilities of doping and strain adjustment, opens a new way toward the fine-tuning of Weyl semimetal layers and heterostructures.
關鍵字 TaAs; Weyl semimetal; MBE growth; new phase; stacking-fault disorder; WAL; HLN
語言 en_US
ISSN 1944-8252
期刊性質 國外
收錄於 SCI
產學合作
通訊作者
審稿制度 是
國別 USA
公開徵稿
出版型式 ,電子版
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