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蔡子萱

TZU-HSUAN TSAI

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期刊論文

學年期 標題 Sdgs 更新時間
094 / 1 Organic Acid Mixing to Improve ITO Film Etching in Flat Panel Display Manufacture 2014-10-15
097 / 1 Metal Removal from Silicon Sawing Waste using the Electrokinetic Method 2011-10-24
096 / 1 Effect of Organic Acids on Copper Chemical Mechanical Polishing 2014-07-18
093 / 2 Glycolic Acid in Hydrogen Peroxide-Based Slurry for Enhancing Copper Chemical Mechanical Polishing 2017-01-13
095 / 2 電化學技術在半導體銅製程中的應用 2011-10-24
091 / 2 Localized Corrosion Effects and Modifications of Acidic and Alkaline Slurries on Copper Chemical Mechanical Polishing 2012-03-19
094 / 2 Wet Etching Mechanisms of ITO Films in Oxalic acid 2017-05-09
091 / 2 A study of copper chemical mechanical polishing in urea–hydrogen peroxide slurry by electrochemical impedance spectroscopy 2013-05-31
094 / 2 Effects of Nonionic Surfactants on Performance of Copper Chemical Mechanical Polishing 2013-05-31

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