Device and method for measuring distribution of atomic resolution deformation
學年 103
學期 2
專利開始日期 2015-04-07
專利結束日期 1900-01-01
作品名稱 Device and method for measuring distribution of atomic resolution deformation
作品名稱（其他語言）
著者 Bong Kyun Jang, Jae-Hyun Kim, Hak-Joo Lee, Kyung-Suk Kim, Chien-Kai Wang
單位
著錄名稱、卷期、頁數
描述
摘要 The present invention relates to an atomic resolution deformation distribution measurement device that can measure a deformation rate of an atomic scale with low expense by improving resolution using an AFM system, and the atomic resolution deformation distribution measurement device includes: a laser source generating a laser beam; a first cantilever and a second cantilever provided close to a measurement specimen or a reference specimen to cause deformation by an atomic force; an optical system controlling a light path of the laser beam so as to cause the laser beam to be sequentially reflected to the first cantilever and the second cantilever and locate the first cantilever and the second cantilever to an image point; a measurement unit measuring the laser beam reflected from the second cantilever; and a stage on which a measurement specimen or a reference specimen is located and movable in X, Y, and Z axis directions.
關鍵字
語言 en_US
相關連結

機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/111748 )