| Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes | |
|---|---|
| 學年 | 96 |
| 學期 | 1 |
| 出版（發表）日期 | 2007-08-01 |
| 作品名稱 | Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes |
| 作品名稱（其他語言） | |
| 著者 | Shang, Neng-chou; Chen, Yi-hung; Ma, Hwong-wen; Lee, Chi-wei; Chang, Cheng-hsin; Yu, Yue-hwa; Lee, Chien-hsien |
| 單位 | 淡江大學土木工程學系 |
| 出版者 | Amsterdam: Elsevier BV |
| 著錄名稱、卷期、頁數 | Journal of Hazardous Materials 147(1-2), pp.307-312 |
| 摘要 | This study investigated the oxidation of methyl methacrylate (MMA) by sole ozonation and ozone/UV treatments. The semi-batch ozonation experiments were proceeded under different reaction conditions to study the effects of ozone dosage and UV radiation on the oxidation of MMA. The experimental results indicated that both the oxidation of MMA by the sole ozonation and O3/UV processes can completely decompose MMA to form the following intermediates within 30 min reaction time. To increase the applied ozone dosage can significantly raise the removal efficiency of MMA. However, the mineralization of MMA via the direct oxidation reaction of molecular ozone was slow, while introducing the UV radiation can promote the mineralization rate of MMA. In addition, the pH value of the oxidized solution in the O3/UV treatment decreased lower than that in the sole ozonation treatment of about 1 unit. The possible scheme of the decomposition pathway of MMA under the ozonation process is proposed in this study. Formic acid and acetic acid were found to be the main ozonated intermediates. |
| 關鍵字 | Ozone; UV radiation; Methyl methacrylate; Ozonation; Semiconductor |
| 語言 | en |
| ISSN | 0304-3894 |
| 期刊性質 | 國外 |
| 收錄於 | |
| 產學合作 | |
| 通訊作者 | Shang, Neng-chou |
| 審稿制度 | 是 |
| 國別 | NLD |
| 公開徵稿 | |
| 出版型式 | 紙本 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/50460 ) |
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