教師資料查詢 | 類別: 期刊論文 | 教師: 張正興CHENG-HSIN CHANG (瀏覽個人網頁)

標題:Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes
學年96
學期1
出版(發表)日期2007/08/01
作品名稱Oxidation of methyl methacrylate from semiconductor wastewater by O3 and O3/UV processes
作品名稱(其他語言)
著者Shang, Neng-chou; Chen, Yi-hung; Ma, Hwong-wen; Lee, Chi-wei; Chang, Cheng-hsin; Yu, Yue-hwa; Lee, Chien-hsien
單位淡江大學土木工程學系
出版者Amsterdam: Elsevier BV
著錄名稱、卷期、頁數Journal of Hazardous Materials 147(1-2), pp.307-312
摘要This study investigated the oxidation of methyl methacrylate (MMA) by sole ozonation and ozone/UV treatments. The semi-batch ozonation experiments were proceeded under different reaction conditions to study the effects of ozone dosage and UV radiation on the oxidation of MMA. The experimental results indicated that both the oxidation of MMA by the sole ozonation and O3/UV processes can completely decompose MMA to form the following intermediates within 30 min reaction time. To increase the applied ozone dosage can significantly raise the removal efficiency of MMA. However, the mineralization of MMA via the direct oxidation reaction of molecular ozone was slow, while introducing the UV radiation can promote the mineralization rate of MMA. In addition, the pH value of the oxidized solution in the O3/UV treatment decreased lower than that in the sole ozonation treatment of about 1 unit. The possible scheme of the decomposition pathway of MMA under the ozonation process is proposed in this study. Formic acid and acetic acid were found to be the main ozonated intermediates.
關鍵字Ozone; UV radiation; Methyl methacrylate; Ozonation; Semiconductor
語言英文
ISSN0304-3894
期刊性質國外
收錄於
產學合作
通訊作者Shang, Neng-chou
審稿制度
國別荷蘭
公開徵稿
出版型式紙本
相關連結
SDGs
Google+ 推薦功能,讓全世界都能看到您的推薦!