Enhanced Electron Field Emission Properties of Conducting Ultrananocrystalline Diamond Films after Cu and Au Ion Implantation
學年 102
學期 2
出版（發表）日期 2014-04-01
作品名稱 Enhanced Electron Field Emission Properties of Conducting Ultrananocrystalline Diamond Films after Cu and Au Ion Implantation
作品名稱（其他語言）
著者 Kamatchi Jothiramalingam Sankaran; Chen, Huang-Chin; Kalpataru Panda; Balakrishnan Sundaravel; Lee, Chi-Young; Tai, Nyan-Hwa; Lin, I-Nan
單位 淡江大學物理學系
出版者 Washington, DC: American Chemical Society
著錄名稱、卷期、頁數 ACS Applied Materials and Interfaces 6(7), pp.4911−4919
摘要 The effects of Cu and Au ion implantation on the structural and electron field emission (EFE) properties of ultrananocrystalline diamond (UNCD) films were investigated. High electrical conductivity of 186 (Ω•cm)-1 and enhanced EFE properties with low turn-on field of 4.5 V/μm and high EFE current density of 6.70 mA/cm2 have been detected for Au-ion implanted UNCD (Au-UNCD) films that are superior to those of Cu-ion implanted UNCD (Cu-UNCD) ones. Transmission electron microscopic investigations revealed that Au-ion implantation induced a larger proportion of nanographitic phases at the grain boundaries for the Au-UNCD films in addition to the formation of uniformly distributed spherically shaped Au nanoparticles. In contrast, for Cu-UNCD films, plate-like Cu nanoparticles arranged in the row-like pattern were formed, and only a smaller proportion of nanographite phases along the grain boundaries was induced. From current imaging tunneling spectroscopy and local current–voltage curves of scanning tunneling spectroscopic measurements, it is observed that the electrons are dominantly emitted from the grain boundaries. Consequently, the presence of nanosized Au particles and the induction of abundant nanographitic phases in the grain boundaries of Au-UNCD films are believed to be the authentic factors, ensuing in high electrical conductivity and outstanding EFE properties of the films.
關鍵字 ultrananocrystalline diamond films; ion implantation; nanographite; electron field emission; transmission electron microscopy; scanning tunneling spectroscopy
語言 en
ISSN 1944-8244
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國別 USA
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