Humidity-dependent friction mechanism in an ultrananocrystalline diamond film
學年 101
學期 2
出版（發表）日期 2013-06-01
作品名稱 Humidity-dependent friction mechanism in an ultrananocrystalline diamond film
作品名稱（其他語言）
著者 N Kumar; Radhika Ramadoss; A T Kozakov; K J Sankaran; S Dash; A K Tyagi; Tai, N H; Lin, I-Nan
單位 淡江大學物理學系
出版者 Bristol: Institute of Physics Publishing Ltd.
著錄名稱、卷期、頁數 Journal of Physics D: Applied Physics 46(27), 275501(8pages)
摘要 Friction behaviour of an ultrananocrystalline diamond film deposited by the microwave plasma-enhanced chemical vapour deposition technique is studied in a controlled humid atmosphere. The value of friction coefficient consistently decreases while increasing the humidity level during the tribology test. This value is 0.13 under 10% relative humidity conditions, which is significantly decreased to 0.004 under 80% relative humidity conditions. Such a reduction in friction coefficient is ascribed to passivation of dangling covalent bonds of carbon atoms, which occurs due to the formation of chemical species of hydroxyl and carboxylic groups such as C–COO, CH3COH and CH2–O bonding states.
關鍵字
語言 en
ISSN 0022-3727
期刊性質 國外
收錄於
產學合作
通訊作者
審稿制度
國別 GBR
公開徵稿
出版型式 紙本
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