Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy
學年 93
學期 2
出版（發表）日期 2005-04-01
作品名稱 Bonding properties and their relation to residual stress and refractive index of amorphous Ta(N,O) films investigated by x-ray absorption spectroscopy
作品名稱（其他語言）
著者 Jan, J. C.; Babu, P. D.; Tsai, H. M.; Pao, C. W.; Chiou, J. W.; Ray, S. C.; Krishna Kumar, K. P.; Pong, W. F.; Tsai, M.-H.; Jong, C. A.; Chin, T. S.
單位 淡江大學物理學系
出版者 College Park: American Institute of Physics
著錄名稱、卷期、頁數 Applied Physics Letters 86(16), 161910(3pages)
摘要 This work presents N, O K-edge x-ray absorption near-edge structure (XANES) and Ta L3-edge extended x-ray absorption fine structure (EXAFS) studies of amorphous Ta(N,O) films prepared with various flow rate ratios of N2/O2. The N and O K-edge XANES and Ta L3-edge EXAFS spectra demonstrate the presence of N2 molecules. These spectra also show that Ta(N,O) films have similar local atomic structure as that of Ta2O5. No evidence of the formation of Ta–N bond was obtained. The intensities of the π* feature in the N K-edge spectra and the features of O 2p–Ta 5d hybridized states were found to correlate with the residual stress and the refractive index, respectively.
關鍵字 tantalum compounds; thin films; amorphous state; internal stresses; refractive index; EXAFS; XANES
語言 en
ISSN 0003-6951
期刊性質 國外
收錄於 SCI
產學合作
通訊作者 Pong, W. F.
審稿制度
國別
公開徵稿
出版型式 紙本
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