Research on Quick Polishing of CVD Diamond Film
學年 96
學期 2
出版(發表)日期 2008-02-01
作品名稱 Research on Quick Polishing of CVD Diamond Film
作品名稱(其他語言)
著者 C.L.Chao; Fan, W.H.; Chou, W.C.; Chien, C.Y.; Lin , H.Y. and J.G.
單位 淡江大學機械與機電工程學系
出版者
著錄名稱、卷期、頁數 Key Engineering Materials 364-366, p.668-673
摘要 Polycrystalline CVD diamond film possesses many advanced physical and mechanical properties which makes it a very important engineering material. However, high hardness value and extreme brittleness have made CVD diamond film a very difficult material to be machined by conventional grinding and polishing processes. In the present research, diamond wafers were pretreated with RIE in an attempt to weaken the top layer and pave the way for subsequent thermochemically polishing. It was found that the diamond grains were anisotropically etched and some high aspect ratio pillar-like micro-structures were formed during the RIE process. These micropillars are relatively easy to be ruptured and removed by the subsequent polishing process. The results showed that this method could effectively speed up the polishing of CVD diamond films.
關鍵字
語言 en
ISSN
期刊性質 國外
收錄於
產學合作
通訊作者
審稿制度
國別 CHE
公開徵稿
出版型式 ,電子版
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機構典藏連結

SDGS 產業創新與基礎設施