Research on Fabricating CVD Diamond Microstructures Using RIE Process
學年 97
學期 2
出版（發表）日期 2009-02-01
作品名稱 Research on Fabricating CVD Diamond Microstructures Using RIE Process
作品名稱（其他語言）
著者 Chou, Wen-chen; Chao, Choung-lii; Fan, Wei-haw; Ma, Kung-jeng
單位 淡江大學機械與機電工程學系
出版者 Stafa-Zurich: Trans Tech Publications Ltd.
著錄名稱、卷期、頁數 Key Engineering Materials 407-408, pp.41-44
摘要 Diamond is one of the most important engineering materials for its extreme hardness, high thermal conductivity value and chemical inertness. Due to its high hardness and strength, it can be ideal candidates for AFM probe or micro-needle. In this research, micro cone-like shaped diamond tips with high aspect ratio formed using reactive ion etching (RIE) method. The scanning electron microscope (SEM), transmission electron microscope (TEM) and micro-Raman spectroscopy were used to study the surface morphology and sub-surface micro-structure before and after RIE process. The results showed that gold could be adopted as mask material during the RIE process. Different microstructures could be obtained using different RIE parameters such as etch duration and reactant gas. After RIE (O2 50sccm, 200W) for 5min the micro cone-like structures (aspect ratio~8) could be observed on the surface if a thin layer of gold was applied as mask. However, under the same RIE conditions, the irregular pillar-like microstructures started to emerge if the etching time was stretched longer.
關鍵字 CVD Diamond; Mask; Microstructure; RIE
語言 en
ISSN 1013-9826; 1662-9795
期刊性質 國外
收錄於 EI
產學合作
通訊作者
審稿制度 是
國別 CHE
公開徵稿
出版型式 紙本
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