Investigation of Thermo-Chemical Polishing of CVD Diamond Film
學年 95
學期 1
出版（發表）日期 2007-01-01
作品名稱 Investigation of Thermo-Chemical Polishing of CVD Diamond Film
作品名稱（其他語言）
著者 Chao, C.L.; Chien, H.H.; Ma, K.J.; Lin, H.Y.
單位 淡江大學機械與機電工程學系
出版者
著錄名稱、卷期、頁數 Key Engineering Materials 329, pp.195-200
摘要 ZnO/Diamond structure has attracted a lot of attentions and heavy investment recently just because diamond has the capability of producing very high surface acoustic wave (around 10,000m/s). In this present study, the microwave chemical vapor deposition (CVD) method was employed to produce diamond films on silicon single crystal. Thermo-chemical polishing experiments were then conducted on the obtained diamond films. The underlying material removal mechanisms, microstructure of the machined surface and related machining conditions were also investigated. Thermo-chemical polishing was proved to be able to remove the diamond film very effectively (4.8μm deep of diamond film was removed in 30 minutes when polishing at 550oC and 5.7m/s). The material removal rate was increased with polishing speed and pressure. Higher polishing temperature would improve the chemical reaction and result in better surface finish.
關鍵字 Chemical Vapor Deposition (CVD);Diamond Film;Thermo-Chemical Polishing
語言 en
ISSN 1662-9795 1013-9826
期刊性質 國外
收錄於
產學合作
通訊作者
審稿制度 否
國別 CHE
公開徵稿
出版型式 ,電子版,紙本
相關連結

機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/65328 )

機構典藏連結
SDGS 產業創新與基礎設施