Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique
學年 99
學期 2
出版（發表）日期 2011-02-01
作品名稱 Effect of CH4/H2 plasma ratio on ultra-low friction of nano-crystalline diamond coating deposited by MPECVD technique
作品名稱（其他語言）
著者 林諭男; Sharma, Neha; Kumar, N.; Sundaravel, B.
單位 淡江大學物理學系
出版者
著錄名稱、卷期、頁數 Tribology International
摘要 Nano-crystalline diamond coatings were deposited on the silicon substrate using Microwave Plasma Enhanced Chemical Vapor Deposition (MPECVD). Experiments were performed by varying the H2 content in CH4/H2 plasma during synthesis. Raman spectral analysis revealed that with decrease in hydrogen content in the CH4 plasma, the ID/IG ratio decreases with the formation of smaller crystallites. Such a film possesses a large grain boundary fraction containing hydrogenated amorphous carbon (a-C:H). During tribological test, sufficient amount of hydrogen present in the grain boundary passivates the dangling σ-bond causing ultra-low friction and extremely low wear evident by improvement in microstructure.
關鍵字 Nano-crystalline diamond;Dangling bonds;Coefficient of friction
語言 en
ISSN
期刊性質 國內
收錄於
產學合作
通訊作者
審稿制度 否
國別 TWN
公開徵稿
出版型式 ,電子版
相關連結

機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/58288 )

機構典藏連結