| Nanoscale surface roughness characterization by full field polarized light-scattering | |
|---|---|
| 學年 | 99 |
| 學期 | 1 |
| 出版（發表）日期 | 2011-01-01 |
| 作品名稱 | Nanoscale surface roughness characterization by full field polarized light-scattering |
| 作品名稱（其他語言） | |
| 著者 | Liu, Cheng-yang; Fu, Wei-en; Lin, Tzeng-yow; Chang, Chi-sheng; Chen, Jay-san |
| 單位 | 淡江大學機械與機電工程學系 |
| 出版者 | London: Elsevier Ltd |
| 著錄名稱、卷期、頁數 | Optics and Lasers in Engineering 49(1), pp.145-151 |
| 摘要 | Characterizing surface roughness in nanoscale nondestructively is an urgent need for semiconductor and wafer manufacturing industries. To meet the need, an optical scatter instrument in bidirectional ellipsometry has been developed for characterizing nanoscale surface roughness, in particular, on the wafers after chemical–mechanical polishing. The polarized angular dependence of out-of-plane light-scattering from nanoscale surface roughness is analyzed and characterized. These analysis and characterization results show strong correlations of surface roughness and angular dependence of bidirectional ellipsometric parameters for full field light-scattering. The experimental findings prove good agreement with theoretical predictions for different surface roughnesses. As a result, the nanoscale surface roughness can be accurately measured and characterized by the angular dependence and the polarization of light scattered from surface. |
| 關鍵字 | Bidirectional ellipsometry; Roughness; Light-scattering measurement |
| 語言 | en |
| ISSN | 0143-8166 |
| 期刊性質 | 國外 |
| 收錄於 | SCI EI |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | |
| 國別 | GBR |
| 公開徵稿 | |
| 出版型式 | 紙本 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/56765 ) |
GoogleAnalytics