Electron field emission properties on UNCD coated Si-nanowires
學年 96
學期 2
出版（發表）日期 2008-04-01
作品名稱 Electron field emission properties on UNCD coated Si-nanowires
作品名稱（其他語言）
著者 Tzeng, Yu-fen; Lee, Yen-chih; Lee, Chi-young; Chiu, Hsin-tien; Lin, I-nan
單位 淡江大學物理學系
出版者 Lausanne: Elsevier S.A.
著錄名稱、卷期、頁數 Diamond and Related Materials 17(4-5), pp.753-757
摘要 The electron field emission (EFE) properties of Si-nanowires (SiNW) were improved by coating a UNCD films on the SiNWs. The SiNWs were synthesized by an electroless metal deposition (EMD) process, whereas the UNCD films were deposited directly on bare SiNW templates using Ar-plasma based microwave plasma enhanced chemical vapor deposition (MPE–CVD) process. The electron field emission properties of thus made nano-emitters increase with MPE–CVD time interval for coating the UNCD films, attaining small turn-on field (E0 = 6.4 V/μm) and large emission current density (Je = 6.0 mA/cm2 at 12.6 V/μm). This is presumably owing to the higher UNCD granulation density and better UNCD-to-Si electrical contact on SiNWs. The electron field emission behavior of these UNCD nanowires emitters is significantly better than the bare SiNW ((E0)SiNWs = 8.6 V/μm and (Je)SiNWs < 0.01 mA/cm2 at the same applied field) and is comparable to those for carbon nanotubes.
關鍵字 Ultra-nano-crystalline diamond (UNCD); Silicon nanowires (SiNWs); Electron-field-emission (EFE)
語言 en
ISSN 0925-9635
期刊性質
收錄於
產學合作
通訊作者 Lin, I-nan
審稿制度
國別 SWZ
公開徵稿
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