Transparent ultrananocrystalline diamond films on quartz substrate | |
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學年 | 96 |
學期 | 2 |
出版(發表)日期 | 2008-04-01 |
作品名稱 | Transparent ultrananocrystalline diamond films on quartz substrate |
作品名稱(其他語言) | |
著者 | Joseph, P. T.; Tai, Nyan-hwa; Chen, Yi-chun; Cheng, Hsiu-fung; 林諭男; Lin, I-nan |
單位 | 淡江大學物理學系 |
出版者 | Elsevier |
著錄名稱、卷期、頁數 | Diamond and Related Materials 17(4-5), pp.476-480 |
摘要 | Highly transparent ultrananocrystalline diamond (UNCD) films were deposited on quartz substrates using microwave plasma enhanced chemical vapor deposition (MPECVD) method. Low temperature growth of high quality transparent UNCD films was achieved by without heating the substrates prior to the deposition. Additionally, a new method to grow NCD and microcrystalline diamond (MCD) films on quartz substrates has been proposed. Field emission scanning electron microscopy (FESEM) and Raman spectroscopy were used to analyze the surface and structural properties of the films. The surface morphology of UNCD film shows very smooth surface characteristics. The transparent property studies of UNCD film on quartz substrate showed 90% transmittance in the near IR region. The transparent and dielectric properties of UNCD, NCD, and MCD films on quartz substrates were compared and reported. |
關鍵字 | |
語言 | en |
ISSN | 0925-9635 |
期刊性質 | 國外 |
收錄於 | |
產學合作 | |
通訊作者 | |
審稿制度 | 否 |
國別 | CHE |
公開徵稿 | |
出版型式 | ,電子版 |
相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/42025 ) |