Microstructure and electronic properties of ultra-nano-crystalline-diamond thin films
學年 108
學期 2
出版（發表）日期 2020-07-01
作品名稱 Microstructure and electronic properties of ultra-nano-crystalline-diamond thin films
作品名稱（其他語言）
著者 R.W. Thoka; S.J. Moloi; Sekhar C. Ray; W. F. Pong; I.-N. Lin
單位
出版者
著錄名稱、卷期、頁數 Journal of Electron Spectroscopy and Related Phenomena 242, 146968
摘要 Ultra-nano-crystalline diamond (UNCD) thin films with average thickness ∼200 nm, were grown on n-type mirror polished silicon (100) substrates using microwave plasma enhanced chemical vapour deposition system in different gas (H2 - N2 - Ar - CH4) composition plasma atmospheres at 1200 W (2.45 GHz) and in a pressure of 120 Torr with plasma-temperature ∼475 °C. Raman spectroscopy was used for microstructural study and nano-indentation was used for Hardness/Young’s modulus study; whereas X-ray absorption near edge structure, X-ray photoelectron and ultraviolet photoemission spectroscopies were used for electronic structure of UNCD thin films. The hardness of the films is found to be ∼30 GPa, Young’s modulus ∼300 GPa and induced electron field emission, the turn on electric field, ETOE = 11 V/μm. All results show that the UNCD could be useful for different industrial semiconductor/optoelectronic devices and as flexible materials for thin film coating technology.
關鍵字 UNCD;Raman spectroscopy;Hardness/Young’s modulus;XPS/UPS
語言 en_US
ISSN 1873-2526
期刊性質 國外
收錄於 SCI
產學合作
通訊作者
審稿制度 否
國別 USA
公開徵稿
出版型式 ,電子版,紙本
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