教師資料查詢 | 類別: 期刊論文 | 教師: 李奇旺 Chi-Wang Li (瀏覽個人網頁)

標題:Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
學年108
學期2
出版(發表)日期2020/06/10
作品名稱Iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater through forward osmosis
作品名稱(其他語言)
著者Hau-Ming Chang; Shiao-Shing Chen; Zhi-Sheng Cai; Wen-Shing Chang; Saikat Sinha Ray; Nguyen Cong Nguyen; Chi-Wang Li; Mithilesh Paswan
單位
出版者
著錄名稱、卷期、頁數Journal of Cleaner Production 258, 120587
摘要For the first time, simultaneous iodide recovery and boron removal from thin-film transistor liquid crystal display wastewater were achieved using forward osmosis because iodide is a precious material and boron is toxic with 1 mg/L discharge standard in Taiwan. Cellulose triacetate and thin-film composite with aquaporin flat sheet membranes were tested for different feed solution, pH levels, and draw solution concentrations. The results indicated that the thin-film composite membrane had high boron and iodide rejections (98.4% and 98.3%, respectively) at a pH of 11; however, with a feed boron concentration of 600 mg/L, 9.8 mg/L boron was still present in the draw solution. Cationic surfactant cetyltrimethylammonium bromide was used to enhance the iodide recovery and boron removal efficiencies. Both efficiencies increased to 99.9% with 0.5 mM cetyltrimethylammonium bromide, and only 0.64 mg/L boron was present in the draw solution. In addition, negligible flux reduction was observed for forward osmosis process in the presence of cetyltrimethylammonium bromide. A membrane distillation system was used to concentrate and purify the MgCl2 draw solution. Thus, the hybrid forward osmosis-membrane distillation process can be applied for iodide recovery and boron removal in the thin-film transistor liquid crystal display industry.
關鍵字Forward osmosis;Iodide;Boron;Cetyltrimethylammonium bromide;Membrane distillation
語言英文(美國)
ISSN0959-6526
期刊性質國外
收錄於SCI;
產學合作
通訊作者
審稿制度
國別荷蘭
公開徵稿
出版型式,電子版,紙本
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