教師資料查詢 | 類別: 期刊論文 | 教師: 董崇民 Don, Trong-ming (瀏覽個人網頁)

標題:Novel UV-curable and alkali-soluble resins for light-shielding black matrix application
學年97
學期2
出版(發表)日期2009/02/01
作品名稱Novel UV-curable and alkali-soluble resins for light-shielding black matrix application
作品名稱(其他語言)
著者Kuo, Kuo-huai; Chiu, Wen-yen; Hsieh, Kuo-huang; 董崇民; Don, Trong-ming
單位淡江大學化學工程與材料工程學系
出版者Elsevier
著錄名稱、卷期、頁數European Polymer Journal 45(2), pp.474-484
摘要A carbon black (CB) photo resist, comprising CB, CB dispersant, photo-curable resin, photo-initiator, and solvent, has been developed in order to prepare a light-shielding black matrix (BM) in the liquid crystal display application. In order to prepare a BM with a high opacity property or optical density (OD), the effect of CB such as its particle and concentration on light absorption property was first evaluated, and the results showed that 45 wt% CB with a particle size of about 100 nm in BM could reach an OD value of 4 μm−1. Moreover, six different UV-curable and alkali-soluble resins (A1, A2, and A3; B1, B2, and B3) were synthesized as photo-curable resins. Structures of these resins were characterized by FTIR and GPC, in which concentrations of various functional groups, especially carboxylic acid and double bond, were calculated. Subsequently, their photo-initiated polymerization rate with or without CB were measured. Finally, it was found that through a proper selection of the newly synthesized resins to prepare a carbon black photo resist, a BM with an OD of 4 μm−1 and a good resolution of 10 μm was successfully prepared upon low UV irradiation energy of 50 mJ/cm2.
關鍵字
語言英文
ISSN0014-3057
期刊性質國外
收錄於
產學合作
通訊作者
審稿制度
國別英國
公開徵稿
出版型式,紙本
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