Characterization of Acrylic Copolymers Applied in Negative-type Photoresist via a Ternary Composition Diagram
學年 96
學期 2
出版（發表）日期 2008-03-01
作品名稱 Characterization of Acrylic Copolymers Applied in Negative-type Photoresist via a Ternary Composition Diagram
作品名稱（其他語言）
著者 Lee, Chih-kang; Don, Trong-ming; Lin, Dar-jong; Chen, Chin-chung; Cheng, Liao-ping
單位 淡江大學化學工程與材料工程學系
出版者 Hoboken: John Wiley & Sons, Inc.
著錄名稱、卷期、頁數 Journal of Applied Polymer Science 109, pp.467-474
摘要 Three-component acrylic copolymers used as a binder for negative-type photoresists were synthesized and characterized. First, free radical polymerization was employed to synthesize two-component binders, i.e., acrylic ester copolymers with different ratios of benzyl methacrylate (BZMA) and methacrylic acid (MAA). Thermal behavior, viscosity and molecular weight of the prepared two-component binders were studied. Then, a series of three-component binders were prepared through incorporation of another monomer, 2-hydroxyethyl methacrylate (2-HEMA). FTIR was used to examine the evolution of chemical bonds at various stages of the synthetic process. Thermal analyses, TGA and DSC, were used to evaluate the level of enhancement on thermal stabilities of the prepared three-component binders. Finally, an optimal region in the ternary composition diagram of BZMA, MAA, and 2-HEMA can be identified by comparing the results of acid value, viscosity, and molecular weight of the binder. A negative-type photoresist was prepared using an optimized composition, for which resolution of the circuit could reach the level of 6 μm.
關鍵字 Acrylic copolymer; Binder; Ternary composition diagram; Negative-type photoresist; Copolymerization; Photoresists
語言 en
ISSN 1097-4628
期刊性質 國外
收錄於 SCI EI
產學合作
通訊作者
審稿制度
國別 USA
公開徵稿
出版型式 紙本
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