教師資料查詢 | 類別: 期刊論文 | 教師: 林達鎔 LIN, DAR-JONG (瀏覽個人網頁)

標題:Characterization of Acrylic Copolymers Applied in Negative-type Photoresist via a Ternary Composition Diagram
學年96
學期2
出版(發表)日期2008/03/01
作品名稱Characterization of Acrylic Copolymers Applied in Negative-type Photoresist via a Ternary Composition Diagram
作品名稱(其他語言)
著者Lee, Chih-kang; Don, Trong-ming; Lin, Dar-jong; Chen, Chin-chung; Cheng, Liao-ping
單位淡江大學化學工程與材料工程學系
出版者Hoboken: John Wiley & Sons, Inc.
著錄名稱、卷期、頁數Journal of Applied Polymer Science 109, pp.467-474
摘要Three-component acrylic copolymers used as a binder for negative-type photoresists were synthesized and characterized. First, free radical polymerization was employed to synthesize two-component binders, i.e., acrylic ester copolymers with different ratios of benzyl methacrylate (BZMA) and methacrylic acid (MAA). Thermal behavior, viscosity and molecular weight of the prepared two-component binders were studied. Then, a series of three-component binders were prepared through incorporation of another monomer, 2-hydroxyethyl methacrylate (2-HEMA). FTIR was used to examine the evolution of chemical bonds at various stages of the synthetic process. Thermal analyses, TGA and DSC, were used to evaluate the level of enhancement on thermal stabilities of the prepared three-component binders. Finally, an optimal region in the ternary composition diagram of BZMA, MAA, and 2-HEMA can be identified by comparing the results of acid value, viscosity, and molecular weight of the binder. A negative-type photoresist was prepared using an optimized composition, for which resolution of the circuit could reach the level of 6 μm.
關鍵字Acrylic copolymer; Binder; Ternary composition diagram; Negative-type photoresist; Copolymerization; Photoresists
語言英文
ISSN1097-4628
期刊性質國外
收錄於SCI;EI
產學合作
通訊作者
審稿制度
國別美國
公開徵稿
出版型式紙本
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