Effect of particle size on the photochromic response of PWA/SiO2 nanocomposite | |
---|---|
學年 | 99 |
學期 | 1 |
出版(發表)日期 | 2010-10-01 |
作品名稱 | Effect of particle size on the photochromic response of PWA/SiO2 nanocomposite |
作品名稱(其他語言) | |
著者 | Huang, Feng-Hsi; Chen, Ching-Chung; Lin, Dar-Jong; Don, Trong-Ming; Cheng, Liao-Ping |
單位 | 淡江大學化學工程與材料工程學系 |
出版者 | Dordrecht: Springer Netherlands |
著錄名稱、卷期、頁數 | Journal of Nanoparticle Research 12(8), pp.2941-2950 |
摘要 | A series of photochromic phosphotungstic acid (PWA)/SiO2 composites were synthesized using the sol-gel method. Depending on the feeding schedule of PWA during synthesis, the size of the formed PWA/SiO2 particles varied considerably from as small as 1.2 nm to ca. 10 nm. With decreasing silica particle size, the total contact area/interaction between SiO2 and PWA increases, as revealed by FT-IR and solid-state 29Si-NMR analyses. Particularly, when the size of PWA/SiO2 is ~1 nm, crystallization of PWA is inhibited, and PWA presents as amorphous molecular entities distributing uniformly in the SiO2 host, which is in evidence in the XRD spectroscopy and HR-TEM imaging. In contrast, substantial crystallization of PWA takes place when PWA/SiO2 particles are as large as 10 nm, in which case less amount of surface free Si-OH is available for PWA to make bonds with. Photochromism occurs activated by ultraviolet light irradiation. The rate of coloration/bleaching is found to depend strongly on the particle size of PWA/SiO2; specifically, the rate increases twice when the particle size is reduced from 10 nm to 1.2 nm. |
關鍵字 | Photochromism; Nanocomposite; Phosphotungstic acid; Silica; Crystallization; Optical display; Smart windows |
語言 | en |
ISSN | 1388-0764; 1572-896X |
期刊性質 | 國外 |
收錄於 | SCI |
產學合作 | |
通訊作者 | Cheng, Liao-Ping |
審稿制度 | |
國別 | NLD |
公開徵稿 | |
出版型式 | 紙本 |
相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/58019 ) |