教師資料查詢 | 類別: 期刊論文 | 教師: 董崇民 Don, Trong-ming (瀏覽個人網頁)

標題:Synthesis of UV-curable/alkali-soluble dispersants used for black photoresist with a high loading of carbon black
學年98
學期2
出版(發表)日期2010/05/01
作品名稱Synthesis of UV-curable/alkali-soluble dispersants used for black photoresist with a high loading of carbon black
作品名稱(其他語言)
著者Kuo, Kuo-Huai; Chiu, Wen-Yen; Don, Trong-Ming
單位淡江大學化學工程與材料工程學系
出版者Hoboken: John Wiley & Sons, Inc.
著錄名稱、卷期、頁數Journal of Applied Polymer Science 115(3), pp.1803–1813
摘要This research synthesized a functional dispersant, not only providing a good dispersion of carbon black (CB) but also possessing ultraviolet (UV)-curable and alkali-soluble properties, by a two-step process. Firstly, bisphenol-A epoxy diacrylate was reacted with benzophenone tetracarboxylic dianhydride at different molar ratios to obtain UV-curable/alkali-soluble resins. In the second step, these resins would possess dispersion ability of CB by reaction with an isocyanate-containing methacrylate. The prepared dispersants were evaluated by their dispersion ability and the light absorption property of CB. The results showed that one of the dispersants was able to disperse CB in the solvent up to 10 wt % with a mean particle size about 100 nm. This particular dispersant had a moderate amount of amino-containing groups (such as urethane, amide, and imide) serving as anchoring sites on CB, and a sufficiently long chain (Mn ∼ 2600) to provide a steric repulsion among CB particles. The advantage of this CB/dispersant system is that no other curable resins are needed. By using a suitable photoinitiator, the present CB/dispersant system could reach a polymerization rate of 1.05 × 10−3 (s–1), and a black pattern of 10 μm in width on a glass substrate was obtained through an UV-lithography process.
關鍵字carbon black; dispersions; photoresists
語言英文
ISSN0021-8995; 1097-4628
期刊性質國外
收錄於SCI;EI
產學合作
通訊作者Don, Trong-Ming
審稿制度
國別美國
公開徵稿
出版型式紙本
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