期刊論文
| 學年 | 113 |
|---|---|
| 學期 | 2 |
| 出版（發表）日期 | 2025-06-22 |
| 作品名稱 | Analysis of photocatalytic characteristics and mechanical properties of TiO2 thin films |
| 作品名稱（其他語言） | |
| 著者 | Yu-Tzu Wang; Tien-Li Chang; Ting-Hsueh Chuang; Yue-Zun Jhong; Chun-Yao Hsu |
| 單位 | |
| 出版者 | |
| 著錄名稱、卷期、頁數 | Journal of Materials Science: Materials in Electronics 36, 1076 |
| 摘要 | Using radio frequency reactive sputtering technology, the Ar/N2/O2 gas flow ratio is 45/45/10, and TiO2 thin films are prepared using TiO2 ceramic targets. TiO2 samples were subjected to different heat treatment methods, such as air cooling in the atmosphere, atmospheric annealing, and vacuum annealing at temperatures of 250 °C, 350 °C, and 450 °C, respectively. The impact of post-thermal treatment on the structure, morphology, band gap (Eg) values, photocatalytic activities, and mechanical properties of TiO₂ films was examined. The X-ray diffraction pattern shows that the TiO2 film has an amorphous structure. The as-deposited TiO2 films’ SEM surface morphology is relatively smooth, possibly due to their poor crystallinity. The SEM images show an apparent increase in morphological grain-like features when the thermal annealing temperature increases from 250 to 450 °C. Increasing the heat treatment temperature will reduce the optical Eg value and exhibit excellent photocatalytic characteristics. Heat treatment, which improves the morphological features of the film, may enhance the film’s mechanical properties. The elastic recovery and hardness values slightly increase with a higher nanoindentation load. Experimentally recorded nanoindentations agree well with elastic recovery values from finite element simulations. |
| 關鍵字 | |
| 語言 | en_US |
| ISSN | 1573-482X; 0957-4522 |
| 期刊性質 | 國外 |
| 收錄於 | SCI |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | 否 |
| 國別 | USA |
| 公開徵稿 | |
| 出版型式 | ,電子版,紙本 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/129167 ) |