期刊論文
| 學年 | 96 |
|---|---|
| 學期 | 2 |
| 出版（發表）日期 | 2008-03-01 |
| 作品名稱 | Characterization of Acrylic Copolymers Applied in Negative-type Photoresist via a Ternary Composition Diagram |
| 作品名稱（其他語言） | |
| 著者 | Lee, Chih-kang; Don, Trong-ming; Lin, Dar-jong; Chen, Chin-chung; Cheng, Liao-ping |
| 單位 | 淡江大學化學工程與材料工程學系 |
| 出版者 | Hoboken: John Wiley & Sons, Inc. |
| 著錄名稱、卷期、頁數 | Journal of Applied Polymer Science 109, pp.467-474 |
| 摘要 | Three-component acrylic copolymers used as a binder for negative-type photoresists were synthesized and characterized. First, free radical polymerization was employed to synthesize two-component binders, i.e., acrylic ester copolymers with different ratios of benzyl methacrylate (BZMA) and methacrylic acid (MAA). Thermal behavior, viscosity and molecular weight of the prepared two-component binders were studied. Then, a series of three-component binders were prepared through incorporation of another monomer, 2-hydroxyethyl methacrylate (2-HEMA). FTIR was used to examine the evolution of chemical bonds at various stages of the synthetic process. Thermal analyses, TGA and DSC, were used to evaluate the level of enhancement on thermal stabilities of the prepared three-component binders. Finally, an optimal region in the ternary composition diagram of BZMA, MAA, and 2-HEMA can be identified by comparing the results of acid value, viscosity, and molecular weight of the binder. A negative-type photoresist was prepared using an optimized composition, for which resolution of the circuit could reach the level of 6 μm. |
| 關鍵字 | Acrylic copolymer; Binder; Ternary composition diagram; Negative-type photoresist; Copolymerization; Photoresists |
| 語言 | en |
| ISSN | 1097-4628 |
| 期刊性質 | 國外 |
| 收錄於 | SCI EI |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | |
| 國別 | USA |
| 公開徵稿 | |
| 出版型式 | 紙本 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/53701 ) |