期刊論文
| 學年 | 89 |
|---|---|
| 學期 | 2 |
| 出版（發表）日期 | 2001-05-01 |
| 作品名稱 | CMOS microelectromechanical bandpass filters |
| 作品名稱（其他語言） | |
| 著者 | 楊龍杰; Yang, Lung-jieh; Huang, Tsung-wei; Chang, Pei-zen |
| 單位 | 淡江大學機械與機電工程學系 |
| 出版者 | Elsevier |
| 著錄名稱、卷期、頁數 | Sensors and Actuators A: Physical 90(1-2), pp.148-152 |
| 摘要 | This work fabricates a laminated-suspension microelectromechanical filter, respectively, by a fully compatible CMOS 0.6 μm single poly triple metal (SPTM) process and CMOS 0.35 μm single poly quadri-metal (SPQM) process. Experimentally, due to the top metal layer being used as the etch-resistant mask during the subsequent dry etching. Therefore, this study performs maskless etching with plasma and obtains excellent results including high selectivity and full release of the structure. Additionally, the microelectromechanical filter can be driven by applying low-voltage of around 5 V and a measured center frequency of around 13.1 kHz and a quality factor of around 1871 were obtained for a single-comb resonator operated in air. The filter successful proposed herein has a monolithic integration capability with the relative electric circuits in the standard CMOS 0.35 μm process. |
| 關鍵字 | Microelectromechanical filter;CMOS;Maskless;Monolithic integration |
| 語言 | en |
| ISSN | 0924-4247 |
| 期刊性質 | 國內 |
| 收錄於 | |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | 否 |
| 國別 | TWN |
| 公開徵稿 | |
| 出版型式 | ,電子版 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/45827 ) |