期刊論文

學年 91
學期 1
出版(發表)日期 2003-01-01
作品名稱 Photo-patternable gelatin as protection layers in low-temperature surface micromachinings
作品名稱(其他語言)
著者 Yang, Lung-Jieh; Lin, W. Z.; Yao, T. J.; Tai, Y. C.
單位 淡江大學機械與機電工程學系
出版者 Lausanne: Elsevier S.A.
著錄名稱、卷期、頁數 Sensors and Actuators, A: Physical 103(1-2), pp.284-290
摘要 This paper describes a newly developed low temperature photo-patternable gelatin technology that is useful to produce a thick (>10 μm) gelatin protecting and strengthening layer for weak MEMS microstructures. Example demonstrated here is the gelatin process integrated with the parylene MEMS technology. The complete processing details and formulae are reported and allow anyone to use gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications.
關鍵字 Chemical resistance;Low temperature operations;Microelectromechanical devices;Microstructure;Photoresists;Protective coatings;Stiction;Thick films;Gelatin;Micromachining
語言 en
ISSN 0924-4247
期刊性質 國外
收錄於
產學合作
通訊作者 Yang, Lung-Jieh
審稿制度
國別 SWZ
公開徵稿
出版型式 紙本
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