期刊論文
| 學年 | 95 |
|---|---|
| 學期 | 1 |
| 出版（發表）日期 | 2007-01-01 |
| 作品名稱 | Investigation of Thermo-Chemical Polishing of CVD Diamond Film |
| 作品名稱（其他語言） | |
| 著者 | Chao, C.L.; Chien, H.H.; Ma, K.J.; Lin, H.Y. |
| 單位 | 淡江大學機械與機電工程學系 |
| 出版者 | |
| 著錄名稱、卷期、頁數 | Key Engineering Materials 329, pp.195-200 |
| 摘要 | ZnO/Diamond structure has attracted a lot of attentions and heavy investment recently just because diamond has the capability of producing very high surface acoustic wave (around 10,000m/s). In this present study, the microwave chemical vapor deposition (CVD) method was employed to produce diamond films on silicon single crystal. Thermo-chemical polishing experiments were then conducted on the obtained diamond films. The underlying material removal mechanisms, microstructure of the machined surface and related machining conditions were also investigated. Thermo-chemical polishing was proved to be able to remove the diamond film very effectively (4.8μm deep of diamond film was removed in 30 minutes when polishing at 550oC and 5.7m/s). The material removal rate was increased with polishing speed and pressure. Higher polishing temperature would improve the chemical reaction and result in better surface finish. |
| 關鍵字 | Chemical Vapor Deposition (CVD);Diamond Film;Thermo-Chemical Polishing |
| 語言 | en |
| ISSN | 1662-9795 1013-9826 |
| 期刊性質 | 國外 |
| 收錄於 | |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | 否 |
| 國別 | CHE |
| 公開徵稿 | |
| 出版型式 | ,電子版,紙本 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/65328 ) |