期刊論文
| 學年 | 93 |
|---|---|
| 學期 | 2 |
| 出版（發表）日期 | 2005-03-01 |
| 作品名稱 | Effect of processing parameters on the nucleation behavior of nano-crystalline diamond film |
| 作品名稱（其他語言） | |
| 著者 | 李彥志; Lee, Y. C.; Lin, S. J.; Chia, C. T.; Cheng, H. F.; 林諭男; Lin, I-nan |
| 單位 | 淡江大學物理學系 |
| 出版者 | Elsevier |
| 著錄名稱、卷期、頁數 | Diamond and Related Materials 14(3-7), pp.296-301 |
| 摘要 | The nucleation behavior of nanodiamond films and the associated electron field emission properties were investigated. Among the important CVD parameters, the methane/hydrogen ratio and the total pressure impose most markedly effect, whereas the microwave power and the boron content show least significant effect on the nucleation behavior for the nanodiamonds. Presumably, the prime factor modifying the rate of formation of diamond nuclei is the proportion of C+- and H+-species contained in the plasma. The bias voltage applied for nucleation of diamonds show more marked effect on improving the electron field emission capacity for the nanodiamonds than the boron-content does. It is ascribed to the increase in proportion of grain boundaries, as the grain boundaries are highly conductive and are good emission sites. |
| 關鍵字 | Nanodiamond;Bias enhanced nucleation and growth;Electron field emission |
| 語言 | en |
| ISSN | 0925-9635 |
| 期刊性質 | 國外 |
| 收錄於 | |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | 否 |
| 國別 | CHE |
| 公開徵稿 | |
| 出版型式 | ,紙本 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/27465 ) |