期刊論文
學年 | 96 |
---|---|
學期 | 2 |
出版(發表)日期 | 2008-04-01 |
作品名稱 | Adhesion properties of nitrogen ion implanted ultra-nanocrystalline diamond films on silicon substrate |
作品名稱(其他語言) | |
著者 | Palnitkar, U. A.; Joseph, P. T.; Niu, H.; Huang, H. Y.; Fang, W. L.; Cheng, H. F.; Tai, N. H.; 林諭男; Lin, I-nan |
單位 | 淡江大學物理學系 |
出版者 | Elsevier |
著錄名稱、卷期、頁數 | Diamond and Related Materials 17(4-5), pp.864-867 |
摘要 | Ultra-nanocrystalline diamond (UNCD) films prepared by microwave plasma enhanced chemical vapor deposition were implanted using 0.3 MeV nitrogen ions under a dose of 1013, 1014, and 1015 ions cm− 2. While the surface morphology of the UNCD films was not pronounced modified, the crystallinity of the films was changed appreciably due to ion implantation. The scratch test has been used to study the adhesion of the film to the substrate, which illustrated that the critical load, used as a measure of the adhesive strength, is found to increase with ion dose. Secondary ion mass spectroscopy (SIMS) analyses on the interfacial morphology indicated that the main factor in improving the adhesive strength is the modification on interfacial structure through inter-diffusion between film and substrate. |
關鍵字 | UNCD; Adhesion; Ion implantation; Interface structure |
語言 | en |
ISSN | 0925-9635 |
期刊性質 | 國內 |
收錄於 | |
產學合作 | |
通訊作者 | |
審稿制度 | 否 |
國別 | TWN |
公開徵稿 | |
出版型式 | ,電子版 |
相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/42030 ) |