期刊論文

學年 96
學期 2
出版(發表)日期 2008-04-01
作品名稱 Adhesion properties of nitrogen ion implanted ultra-nanocrystalline diamond films on silicon substrate
作品名稱(其他語言)
著者 Palnitkar, U. A.; Joseph, P. T.; Niu, H.; Huang, H. Y.; Fang, W. L.; Cheng, H. F.; Tai, N. H.; 林諭男; Lin, I-nan
單位 淡江大學物理學系
出版者 Elsevier
著錄名稱、卷期、頁數 Diamond and Related Materials 17(4-5), pp.864-867
摘要 Ultra-nanocrystalline diamond (UNCD) films prepared by microwave plasma enhanced chemical vapor deposition were implanted using 0.3 MeV nitrogen ions under a dose of 1013, 1014, and 1015 ions cm− 2. While the surface morphology of the UNCD films was not pronounced modified, the crystallinity of the films was changed appreciably due to ion implantation. The scratch test has been used to study the adhesion of the film to the substrate, which illustrated that the critical load, used as a measure of the adhesive strength, is found to increase with ion dose. Secondary ion mass spectroscopy (SIMS) analyses on the interfacial morphology indicated that the main factor in improving the adhesive strength is the modification on interfacial structure through inter-diffusion between film and substrate.
關鍵字 UNCD; Adhesion; Ion implantation; Interface structure
語言 en
ISSN 0925-9635
期刊性質 國內
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國別 TWN
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出版型式 ,電子版
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