關鍵字查詢 | 類別:研究報告 | | 關鍵字:奈米顆粒之背向散射光和光子奈米噴流的數值分析與實驗

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序號 學年期 教師動態
1 101/1 機電系 劉承揚 教授 研究報告 發佈 奈米顆粒之背向散射光和光子奈米噴流的數值分析與實驗 , [101-1] :奈米顆粒之背向散射光和光子奈米噴流的數值分析與實驗研究報告奈米顆粒之背向散射光和光子奈米噴流的數值分析與實驗Numerical Analysis and Experiment of Light Backscattering and Photonic Nanojet of Nanoparticles劉承揚淡江大學機械與機電工程學系奈米顆粒; 背向散射光; 光子奈米噴流; Nanoparticle; light backscattering; photonic nanojet計畫編號:NSC101-2221-E032-009
 研究期間:201208~201307
 研究經費:722,000行政院國家科學委員會A major concern to the high technology industry for surface qualities is the detection of nanoscale surface characterization on silicon wafers. The optical inspection instruments with high resolution and sensitivity are required for semiconductor industry, flat panel display industry and precision optical components industry. The diffraction limit of lightwave, which is caused by the loss of evanescent waves in the far field that carry high spatial frequency information, limits the resolution of optical microscope to the order of wavelength of lightwave used to image the object. Projecting a diffraction limited image into the far field would require recovery of the evanescen
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