關鍵字查詢 | 類別:專利 | | 關鍵字:Thermal-chemical polishing devices and method thereof

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序號 學年期 教師動態
1 91/2 機電系 趙崇禮 教授 專利 發佈 Thermal-chemical polishing devices and method thereof , [91-2] :Thermal-chemical polishing devices and method thereof專利Thermal-chemical polishing devices and method thereof趙崇禮; Chao, Choung-lii; Ma, Kung-jeng; Lin, Hung-yi淡江大學機械與機電工程學系United States Patent: 6,739,946;Application number: 10/444,979;國際分類號:B24B 49/00; B24B 49/14; B24B 37/04; B24B 049/00; B24B 051/00;專利國別:美國A thermal-chemical polishing device and method for polishing a diamond film of a workpiece, the device includes a horizontally displaced first rotatable high rpm shaft and a vertically displaced second rotatable high rpm shaft that are perpendicular. The first shaft is made of a material from transition metals or rare-earth elements which undergo a chemical reaction with the diamond film at high temperature. The circumferential surface of the first shaft has a predefined heating region. The second shaft moves axially towards the first shaft to allow the diamond film to make contact with the heating region of the first shaft. A heating unit is provided to heat up the
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