關鍵字查詢 | 類別:期刊論文 | | 關鍵字:The Effect of Ion Implantation on Field Emission Property of Nanodiamond Films

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序號 學年期 教師動態
1 97/1 物理系 林諭男 教授 期刊論文 發佈 The Effect of Ion Implantation on Field Emission Property of Nanodiamond Films , [97-1] :The Effect of Ion Implantation on Field Emission Property of Nanodiamond Films期刊論文The Effect of Ion Implantation on Field Emission Property of Nanodiamond FilmsChen, Huang-chin; Palnitkar, Umesh; Niu, Huan; Cheng, Hsiu-fung; 林諭男; Lin, I-nan淡江大學物理學系American Scientific PublishersJournal of Nanoscience and Nanotechnology 8(8), pp.4141-4145Nanocrystalline diamond films prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) were implanted using 110 keV nitrogen ions under fluence ranging from 10(13)-10(14) ions/cm2. Scanning Electron Microscopy (SEM) and Raman spectroscopy were used to analyze the changes in the surface of the films before and after ion implantation. Results show that with nitrogen ion implantation in nanocrystalline diamond film cause to decrease in diamond crystallinity. The field emission measurement shows a sharp increase in current density with increase in dose. The ion implantation also alters the turn on field. It is observed that the structural dam
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