關鍵字查詢 | 類別:期刊論文 | | 關鍵字:Formation of BN-covered silicene on ZrB2/Si(111

[第一頁][上頁]1[次頁][最末頁]目前在第 1 頁 / 共有 01 筆查詢結果
序號 學年期 教師動態
1 109/1 物理系 李啟正 助理教授 期刊論文 發佈 Formation of BN-covered silicene on ZrB2/Si(111) by adsorption of NO and thermal processes , [109-1] :Formation of BN-covered silicene on ZrB2/Si(111) by adsorption of NO and thermal processes期刊論文Formation of BN-covered silicene on ZrB2/Si(111) by adsorption of NO and thermal processesJun Yoshinobu; Kozo Mukai; Hiroaki Ueda; Shinya Yoshimoto; Sumera Shimizu; Takanori Koitaya; Hiroyuki Noritake; Chi-Cheng Lee; Taisuke Ozaki; Antoine Fleurence; Rainer Friedlein; Yukiko Yamada-TakamuraThe Journal of Chemical Physics 153, 064702We have investigated the adsorption and thermal reaction processes of NO with silicene spontaneously formed on the ZrB2/Si(111) substrate using synchrotron radiation x-ray photoelectron spectroscopy (XPS) and density-functional theory calculations. NO is dissociatively adsorbed on the silicene surface at 300 K. An atomic nitrogen is bonded to three Si atoms most probably by a substitutional adsorption with a Si atom of silicene (N≡Si3). An atomic oxygen is inserted between two Si atoms of the silicene (Si—O—Si). With increasing NO exposure, the two-dimensional honey
[第一頁][上頁]1[次頁][最末頁]目前在第 1 頁 / 共有 01 筆查詢結果