期刊論文
| 學年 | 100 |
|---|---|
| 學期 | 2 |
| 出版（發表）日期 | 2012-06-01 |
| 作品名稱 | Characterization study of GaN-based epitaxial layer and light-emitting diode on nature-patterned sapphire substrate |
| 作品名稱（其他語言） | |
| 著者 | Lin, H.Y.; Chen, Y.J.; Chang, C.L.; Li, X.F.; Kuo, C.H.; Hsu, S.C.; Liu, C.Y. |
| 單位 | 淡江大學化學工程與材料工程學系 |
| 出版者 | New York: Cambridge University Press |
| 著錄名稱、卷期、頁數 | Journal of Materials Research 27(6), pp.971-977 |
| 摘要 | Chemical wet etching on c-plane sapphire wafers by three etching solutions (H3PO4, H2SO4, and H3PO4/H2SO4 mixing solution) was studied. Among these etching agents, the mixing H3PO4/H2SO4 solution has the fastest etching rate (1.5 μm/min). Interestingly, we found that H2SO4 does not etch the c-plane sapphire wafer in thickness; instead, a facet pyramidal pattern is formed on the c-plane sapphire wafer. GaN light-emitting diode (LED) epitaxial structure was grown on the sapphire wafer with the pyramidal pattern and the standard flat sapphire wafer. X-ray diffraction and photoluminescence measurement show that the pyramidal pattern on the sapphire wafer improved crystalline quality but augmented the compressive stress level in the GaN LED epilayer. The horizontal LED chips fabricated on the pyramidal-patterned sapphire wafer have a larger light output than the horizontal LED chips fabricated on the standard flat sapphire wafer by 20%. |
| 關鍵字 | III–V;Semiconducting |
| 語言 | en |
| ISSN | 0884-2914 2044-5326 |
| 期刊性質 | 國外 |
| 收錄於 | SCI |
| 產學合作 | |
| 通訊作者 | Liu, C.Y. |
| 審稿制度 | 是 |
| 國別 | USA |
| 公開徵稿 | |
| 出版型式 | ,電子版,紙本 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/89121 ) |