會議論文
| 學年 | 90 |
|---|---|
| 學期 | 1 |
| 發表日期 | 2002-01-20 |
| 作品名稱 | Photo-patternable gelatin as protection layers in surface micromachinings |
| 作品名稱（其他語言） | |
| 著者 | Yang, Lung-jieh; Lin, Wei-zhi; Yao, Tze-jung; Tai, Yu-chong |
| 作品所屬單位 | 淡江大學機械與機電工程學系 |
| 出版者 | N.Y.: Institute of Electrical and Electronic Engineers (IEEE) |
| 會議名稱 | Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on |
| 會議地點 | Las Vegas, NV, USA |
| 摘要 | This paper describes a newly developed low-temperature photo-patternable Gelatin technology that is useful to produce a thick (greater than 10 microns) Gelatin protecting and strengthening layer for weak MEMS micro-structures. Example demonstrated here is the Gelatin process integrated with the Parylene MEMS technology. What is reported here is the complete processing details and formulae that allow anyone to use Gelatin like photo-resist. We find that it is a chemical-resistant and mechanical-robust material for MEMS applications. |
| 關鍵字 | |
| 語言 | en |
| 收錄於 | |
| 會議性質 | 國際 |
| 校內研討會地點 | |
| 研討會時間 | 20020120~20020124 |
| 通訊作者 | |
| 國別 | USA |
| 公開徵稿 | |
| 出版型式 | 紙本 |
| 出處 | Micro Electro Mechanical Systems, 2002. The Fifteenth IEEE International Conference on, pp.471-474 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/38061 ) |