期刊論文
| 學年 | 97 |
|---|---|
| 學期 | 1 |
| 出版（發表）日期 | 2008-08-01 |
| 作品名稱 | The Effect of Ion Implantation on Field Emission Property of Nanodiamond Films |
| 作品名稱（其他語言） | |
| 著者 | Chen, Huang-chin; Palnitkar, Umesh; Niu, Huan; Cheng, Hsiu-fung; 林諭男; Lin, I-nan |
| 單位 | 淡江大學物理學系 |
| 出版者 | American Scientific Publishers |
| 著錄名稱、卷期、頁數 | Journal of Nanoscience and Nanotechnology 8(8), pp.4141-4145 |
| 摘要 | Nanocrystalline diamond films prepared by microwave plasma enhanced chemical vapor deposition (MPECVD) were implanted using 110 keV nitrogen ions under fluence ranging from 10(13)-10(14) ions/cm2. Scanning Electron Microscopy (SEM) and Raman spectroscopy were used to analyze the changes in the surface of the films before and after ion implantation. Results show that with nitrogen ion implantation in nanocrystalline diamond film cause to decrease in diamond crystallinity. The field emission measurement shows a sharp increase in current density with increase in dose. The ion implantation also alters the turn on field. It is observed that the structural damage caused by ion implantation plays a significant role in emission behaviour of nanocrystalline diamonds. |
| 關鍵字 | |
| 語言 | en |
| ISSN | 1533-4880 |
| 期刊性質 | 國外 |
| 收錄於 | |
| 產學合作 | |
| 通訊作者 | |
| 審稿制度 | 否 |
| 國別 | USA |
| 公開徵稿 | |
| 出版型式 | ,電子版 |
| 相關連結 |
機構典藏連結 ( http://tkuir.lib.tku.edu.tw:8080/dspace/handle/987654321/42016 ) |